Fabrication Equipment is used for top-down nanofabrication on a variety of substrates. Included in this category is equipment used to deposit a wide variety of materials, image those materials as well as substrates, oxidize and diffuse materials, provide back-end processing, and synthesize nanoparticles using wet-chemical methods.
For new visitors, Overview of capabilities are described at the top of each topic landing page.
Thermal
- Blue M Furnace
- H2S CVD Furnace
- Jipelec RTA
- Nitric Oxide Anneal
- Nitrogen Anneal
- Protemp Horizontal Furnaces
Patterning
- Photomask Fabrication
- Spin Coating
- Photoresist Baking
- Optical Lithography
- Electron Beam Lithography
- Nanonex NX-2000
- PLS6MW Laser Engraver
- Photoresist Dry Film Laminator
- Laurell EDC-650 Spin Processor
Etching
- ICP RIE
- CCP RIE
- AJA ICP Argon Ion Mill Etcher
- Xactix E1 Xenon Difluoride (XeF2) Etcher
- Tousimis Automegasamdri 915B Critical Point Dryer
- Wet Etching
Deposition
- Atomic Layer Deposition (ALD)
- PECVD (Plasma Enhanced Chemical Vapor Deposition)
- CVD
- Evaporation
- Sputtering
- Other
- Electrodeposition
- Materials in Vacuum
- Metallization Sources